Stability of electron emission current in hydrogen-free diamond-like carbon deposited by plasma enhanced chemical vapor deposition

被引：16

作者：

Chung, SJ

Moon, JH

Park, KC

Oh, MH

Milne, WI

Jang, J

机构：

[1] KOREA ADV INST SCI & TECHNOL,SEOUL,SOUTH KOREA

[2] UNIV CAMBRIDGE,CAMBRIDGE CB2 1PZ,ENGLAND

来源：

JOURNAL OF APPLIED PHYSICS | 1997年 / 82卷 / 08期

关键词：

D O I：

10.1063/1.366286

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the electron emission characteristics of the hydrogen-free diamondlike carbon (DLC) and conventional DLC films. The electron emission current of conventional DLC increases at first and then decreases continuously with bias stress time. The emission current of the hydrogen-free DLC, deposited by the layer-by-layer technique, increases at first and then stabilizes with increasing stress time. The resistivity of the hydrogen-free DLC decreases after long bias stress, and that appears to be due to the changes in the density of states in the gap of the hydrogen-free DLC. (C) 1997 American Institute of Physics.

引用

页码：4047 / 4050

页数：4

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