Nano- and micro-technology applications of focused ion beam processing

被引：12

作者：

Moore, DF ^{[1
]}

Daniel, JH ^{[1
]}

Walker, JF ^{[1
]}

机构：

[1] FEI EUROPE LTD,CAMBRIDGE CB4 4PS,ENGLAND

来源：

MICROELECTRONICS JOURNAL | 1997年 / 28卷 / 04期

关键词：

D O I：

10.1016/S0026-2692(96)00072-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Advances in focused ion beam technology including higher current density, finely focused beams under computer control are making micromachining an excellent prototyping route for devices and a commercial possibility for production. This paper concentrates on new applications of focused ion beam processing in Si based microdevices and in sensors, including high-resolution patterning of YBaCuO superconducting Josephson junction devices. (C) 1997 Elsevier Science Ltd.

引用

页码：465 / 473

页数：9

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