Infrared spectroscopy of strained Si1-yCy alloys (0<=y<=0.015) grown on silicon

被引:14
作者
Pressel, K
Fischer, GG
Zaumseil, P
Kim, M
Osten, HJ
机构
[1] Institute for Semiconductor Physics, 15230 Frankfurt/Oder
关键词
infrared spectroscopy; alloys; silicon; carbon;
D O I
10.1016/S0040-6090(96)09267-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have performed infrared absorption spectroscopy and X-ray diffraction measurements on strained Si1-yCy layers grown by molecular beam epitaxy on Si substrates. Our experiments show that the formation of substitutional carbon and the appearance of beta-SiC precipitates depend on growth rate and growth temperature. Post-growth annealing experiments at temperatures higher than 850 degrees C cause the formation of beta-SiC precipitates accompanied by a decrease of substitutional carbon. The simulation of the X-ray data shows that substitutional carbon is lost mainly near the surface. Infrared absorption studies reveal that the loss is accompanied by the formation of beta-SiC precipitates in the near-surface region. Post growth moderate annealing experiments below 800 degrees C lead to a smaller linewidth for the carbon vibrational mode, indicating improved crystal quality.
引用
收藏
页码:133 / 136
页数:4
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