Coupled strained-layer InGaAs quantum-well improvement of an InAs quantum dot AlGaAs-GaAs-InGaAs-InAs heterostructure laser

被引:53
作者
Chung, T [1 ]
Walter, G
Holonyak, N
机构
[1] Univ Illinois, Elect Engn Res Lab, Urbana, IL 61801 USA
[2] Univ Illinois, Ctr Compound Semicond Microelect, Urbana, IL 61801 USA
关键词
D O I
10.1063/1.1430025
中图分类号
O59 [应用物理学];
学科分类号
摘要
Data are presented showing that, besides the improvement in carrier collection, it is advantageous to locate strain-matching auxiliary InGaAs layers [quantum wells (QWs)] within tunneling distance of a single-quantum-dot (QD) layer of an AlGaAs-GaAs-InGaAs-InAs QD heterostructure laser to realize also smaller size QDs of greater density and uniformity. The QD density is changed from 2x10(10)/cm(2) for a 50 Angstrom GaAs coupling barrier (QW to QD) to 3x10(10)/cm(2) for a 5 Angstrom barrier. The improved QD density and uniformity, as well as improved carrier collection, make possible room-temperature continuous-wave (cw) QD+QW laser operation (a single InAs QD layer) at reasonable diode length (similar to1 mm), current density 586 A/cm(2), and wavelength 1057 nm. The cw 300 K coupled InAs QD and InGaAs QW AlGaAs-GaAs-InGaA-InAs heterostructure lasers are grown by metalorganic chemical vapor deposition. (C) 2001 American Institute of Physics.
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页码:4500 / 4502
页数:3
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