Study of the irradiation damage in SiC by ion channeling

被引:5
作者
Kokkoris, M [1 ]
Kossionides, S
Kyriakis, A
Zachariadou, K
Fanourakis, G
Vlastou, R
Paradellis, T
机构
[1] NCSR Demokritos, Inst Nucl Phys, Lab Mat Anal, GR-15310 Athens, Greece
[2] Natl Tech Univ Athens, Dept Phys, GR-15780 Athens, Greece
关键词
backscattering; channeling; SiC crystal; lithium; Lely; RBS;
D O I
10.1016/S0168-583X(01)01022-9
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The importance of silicon carbide as a wide band gap semiconductor is widely accepted and well documented. Its excellent physical properties (chemical inertness, high-temperature strength, low thermal expansion, extreme hardness) make it the most promising substitute for traditional semiconductors. especially when high-temperature, high-voltage power. and high-frequency devices are concerned. In the present work. the gradual amorphization of a SiC Lely (21 R) crystal hen irradiated with 8 MeV Li-7 ions in a random direction up to a maximum dose of approximately 1 x 10(16) particles/cm(2). is being Studied. using the progressive change of channeling parameters for different depths. The results refer to the energy region of similar to1 MeV/nucleon. and an attempt is made in order to explain the peculiarities of the experimental spectra and the mechanism of defect production in SiC. As in previous studies. a change in color was observed after irradiation in the random mode, indicating that the problem of irradiation damage in SiC caused by light ion be beams needs further investigation. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:78 / 83
页数:6
相关论文
共 22 条
[1]   DEFECT PRODUCTION AND ANNEALING DUE TO HIGH-ENERGY ION-IMPLANTATION .1. SILICON [J].
BELYKH, TA ;
GORODISHCHENSKY, AL ;
KAZAK, LA ;
SEMYANNIKOV, VE ;
URMANOV, AR .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1990, 51 (03) :242-246
[2]   Silicon carbide MOSFET technology [J].
Brown, DM ;
Downey, E ;
Ghezzo, M ;
Kretchmer, J ;
Krishnamurthy, V ;
Hennessy, W ;
Michon, G .
SOLID-STATE ELECTRONICS, 1996, 39 (11) :1531-1542
[3]   MEGAVOLT ARSENIC IMPLANTATION INTO SILICON [J].
BYRNE, PF ;
CHEUNG, NW ;
SADANA, DK .
THIN SOLID FILMS, 1982, 95 (04) :363-367
[4]   ION-BEAM-INDUCED CRYSTALLIZATION AND AMORPHIZATION OF SILICON [J].
ELLIMAN, RG ;
WILLIAMS, JS ;
BROWN, WL ;
LEIBERICH, A ;
MAHER, DM ;
KNOELL, RV .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :435-442
[5]   Damage in silicon carbide induced by Rutherford backscattering analysis [J].
Fukarek, W ;
Yankov, RA ;
Anwand, W ;
Heera, V .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 142 (04) :561-570
[6]   Tracks of high energy heavy ions in solids [J].
Furuno, S ;
Otsu, H ;
Hojou, K ;
Izui, K .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 107 (1-4) :223-226
[7]   Damage evolution in Al-implanted 4H SiC [J].
Hallén, A ;
Persson, POÅ ;
Kuznetsov, AY ;
Hultman, L ;
Svensson, BG .
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 :869-872
[8]   Heavy-ion induced damage of crystalline Ge and W in the 0.5-8 A MeV range [J].
Huber, H ;
Assmann, W ;
Karamian, SA ;
Mieskes, HD ;
Nolte, H ;
Gazis, E ;
Kokkoris, M ;
Kossionides, S ;
Vlastou, R ;
Grötzschel, R ;
Mücklich, A ;
Prusseit, W .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 146 (1-4) :309-316
[9]   Channeled implants in 6H silicon carbide [J].
Janson, MS ;
Hallén, A ;
Godignon, P ;
Kuznetsov, AY ;
Linnarsson, MK ;
Morvan, E ;
Svensson, BG .
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 :889-892
[10]   Ion-channeling studies of interfaces and defect properties in silicon carbide [J].
Jiang, W ;
Weber, WJ .
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 :957-960