Synthesis of tin oxide films by dual ion beam sputtering using Sn target and oxygen ion beam

被引:9
作者
Choe, YS
Chung, JH
Kim, DS
Baik, HK
机构
[1] Yonsei Univ, Dept Engn Met, Seodaemun Ku, Seoul 120749, South Korea
[2] TYM R&D Ctr, Mat Res Lab, Yongin 449870, Kyunggi Do, South Korea
关键词
dual ion beam sputtering; oxygen ion-beam; SnO2; tin target;
D O I
10.1016/S0257-8972(98)00759-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The properties of tin oxide films deposited at room temperature by dual ion beam sputtering (DIBS) using Sn targets and oxygen ion-beam have been examined as a function of oxygen ion energy. Studies by X-ray diffraction (XRD) showed that, with increasing oxygen ion-beam energy, the amorphous microstructure transformed into a crystalline SnO2 phase and the preferred orientations varied from (211), (101) to (002) on Si(100). Together with X-ray photoelectron spectroscopy (XPS), the Rutherford back-scattering (RBS) analyses revealed that, with an increase of oxygen ion-beam energy, the oxygen content and the packing density of the films increased slightly up to a value close to the stoichiometry of SnO2. These results indicate that crystalline SnO2 films can be synthesized at room temperature using DIBS with Sn target and oxygen ion-beam and also that the energetic oxygen ion-beams affect the phase formation, crystalline structure and the preferred orientation of the films. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:267 / 270
页数:4
相关论文
共 11 条
[1]   Ion beam sputtering of SnO2 with low energy oxygen ion beams [J].
Choe, YS ;
Chung, JH ;
Kim, DS ;
Baik, HK .
THIN SOLID FILMS, 1999, 341 (1-2) :230-233
[2]   PROPERTIES OF ELECTRON-BEAM-EVAPORATED TIN OXIDE-FILMS [J].
DAS, D ;
BANERJEE, R .
THIN SOLID FILMS, 1987, 147 (03) :321-331
[3]   The effects of heat treatment on the gas sensitivity of reactively sputtered SnO2 films [J].
Huang, JL ;
Kuo, DW ;
Shew, BY .
SURFACE & COATINGS TECHNOLOGY, 1996, 79 (1-3) :263-267
[4]   X-RAY PHOTOELECTRON AUGER ELECTRON SPECTROSCOPIC STUDIES OF TIN AND INDIUM METAL FOILS AND OXIDES [J].
LIN, AWC ;
ARMSTRONG, NR ;
KUWANA, T .
ANALYTICAL CHEMISTRY, 1977, 49 (08) :1228-1235
[5]   SIMPLE METHOD FOR DETERMINATION OF OPTICAL-CONSTANTS N,K AND THICKNESS OF A WEAKLY ABSORBING THIN-FILM [J].
MANIFACIER, JC ;
GASIOT, J ;
FILLARD, JP .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1976, 9 (11) :1002-1004
[6]   MODIFICATION OF THE OPTICAL AND STRUCTURAL-PROPERTIES OF DIELECTRIC ZRO2 FILMS BY ION-ASSISTED DEPOSITION [J].
MARTIN, PJ ;
NETTERFIELD, RP ;
SAINTY, WG .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) :235-241
[7]   ION-BEAM BOMBARDMENT EFFECTS DURING FILM DEPOSITION [J].
ROSSNAGEL, SM ;
CUOMO, JJ .
VACUUM, 1988, 38 (02) :73-81
[8]  
ROSSNAGEL SM, 1987, MRS BULL, V16, P40
[9]   X-RAY AND ELECTRON-DIFFRACTION STUDIES OF CHEMICALLY VAPOUR-DEPOSITED TIN OXIDE-FILMS [J].
SUNDARAM, KB ;
BHAGAVAT, GK .
THIN SOLID FILMS, 1981, 78 (01) :35-40
[10]   CHARACTERIZATION OF TIN OXIDES BY X-RAY-PHOTOEMISSION SPECTROSCOPY [J].
THEMLIN, JM ;
CHTAIB, M ;
HENRARD, L ;
LAMBIN, P ;
DARVILLE, J ;
GILLES, JM .
PHYSICAL REVIEW B, 1992, 46 (04) :2460-2466