Fabrication of ZnTe nanohole arrays by reactive ion etching using anodic alumina templates

被引：40

作者：

Guo, QX ^{[1
]}

Tanaka, T

Nishio, M

Ogawa, H

Mei, XY

Ruda, H

机构：

[1] Saga Univ, Fac Sci & Engn, Dept Elect & Elect Engn, Saga 8408502, Japan

[2] Univ Toronto, Dept Mat Sci & Engn, Energenius Ctr Adv Nanotechnol, Toronto, ON M5S 3E4, Canada

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2002年 / 41卷 / 2A期

关键词：

zinc telluride; reactive ion etching; anodic alumina template; nanohole array; photonic crystal;

D O I：

10.1143/JJAP.41.L118

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly ordered uniform ZnTe nanohole arrays were successfully fabricated by reactive ion etching using anodic alumina template. These ZnTe nanohole arrays transferred exactly the hexagonal lattice pattern of the Original alumina template. Using this method ordered ZnTe nanoholes with pore diameter front 10 nm to several hundred rim can be fabricated. The simplicity. flexibility. and practicality of this technique makes it a prospective method for developing future optical and electronic devices.

引用

页码：L118 / L120

页数：3

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