Valence band discontinuity at a cubic GaN/GaAs heterojunction measured by synchrotron-radiation photoemission spectroscopy

被引:57
作者
Ding, SA [1 ]
Barman, SR [1 ]
Horn, K [1 ]
Yang, H [1 ]
Yang, B [1 ]
Brandt, O [1 ]
Ploog, K [1 ]
机构
[1] PAUL DRUDE INST FESTKORPERELEKT,D-10117 BERLIN,GERMANY
关键词
D O I
10.1063/1.118886
中图分类号
O59 [应用物理学];
学科分类号
摘要
The valence band discontinuity of the n-type cubic GaN/GaAs heterojunction is measured by means of angle-resolved photoemission spectroscopy using synchrotron radiation. High quality cubic GaN films are grown on GaAs(100) substrates by nitrogen plasma-assisted molecular beam epitaxy, and the valence band discontinuity is determined by a combination of core and valence level spectra. A value of Delta E-v-(1.84+/-0.1) eV across the GaN/GaAs heterojunction is obtained, which means that the discontinuity in the conduction bands at this interface is very small, such that a vertical contact scheme may be realized for GaN/GaAs heterojunctions. (C) 1997 American Institute of Physics.
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页码:2407 / 2409
页数:3
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