Atomic structure of a (2 x 1) reconstructed NiSi2/Si(001) interface -: art. no. 116103

被引：45

作者：

Falke, U ^{[1
]}

Bleloch, A

Falke, M

Teichert, S

机构：

[1] SERC, Daresbury Lab, UK SuperSTEM, Warrington WA4 4AD, Cheshire, England

[2] TU Chemnitz, Inst Phys, D-09107 Chemnitz, Germany

来源：

PHYSICAL REVIEW LETTERS | 2004年 / 92卷 / 11期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1103/PhysRevLett.92.116103

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Nickel disilicide/silicon (001) interfaces were investigated by aberration corrected scanning transmission electron microscopy (STEM). The atomic structure was derived directly from the high spatial resolution high angle annular dark field STEM images without recourse to image simulation. It comprises fivefold coordinated silicon and sevenfold coordinated nickel sites at the interface and shows a 2x1 reconstruction. The proposed structure has not been experimentally observed before but has been recently predicted theoretically by others to be energetically favored.

引用

页码：116103 / 1

页数：4

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