Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

被引:47
作者
Chappé, JM
Martin, N
Pierson, JF
Terwagne, G
Lintymer, J
Gavoille, J
Takadoum, J
机构
[1] Ecole Natl Super Mecan & Microtech, LMS, F-25030 Besancon, France
[2] Univ Franche Comte, CREST, UMR 6000, CNRS, F-25211 Montbeliard, France
[3] Fac Univ Notre Dame Paix, Lab Anal React Nucl, B-5000 Namur, Belgium
关键词
reactive sputtering; titanium oxynitride; water vapour; high temperature;
D O I
10.1016/j.apsusc.2003.09.028
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering using a titanium metallic target, argon, nitrogen and water vapour as reactive gases. The nitrogen partial pressure was kept constant during every deposition whereas that of the water vapour was systematically changed from 0 to 0.1 Pa. These films were made at room temperature (293 K) (set A) and at 673 K (set B). The study consisted in comparing the evolution of deposition parameters like target potential or deposition rate and physical properties of films for each set. Elemental composition measurements obtained by RBS and NRA revealed a reverse and continuous evolution of nitrogen and oxygen contents. Structure and morphology of the films were analysed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Films deposited at room temperature became amorphous with an increasing supply of water vapour. A higher substrate temperature led to significant changes of the crystallographic structure: from fcc TiN without water vapour to a mixture of anatase + rutile for large amount of water vapour. The optical transmittance spectra of the film/glass substrate system were measured in the visible region as a function of the water vapour pressure. For both sets A and B, optical transmittance was influenced by the water vapour partial pressure. Electrical conductivity measured against temperature was gradually modified from metallic (sigma(300 K) = 1.49 x 10(4) S m(-1)) to semiconducting behaviour (sigma(300) (K) = 2.15 S m(-1)) with an increasing supply of the water vapour partial pressure. Moreover, coatings prepared at room temperature exhibited a surprising maximum of the electrical conductivity for a small amount of water vapour (set A). Such surprising evolution vanished for set B with a restricted range of conductivity from sigma(300 K) = 1.1 x 10(5) to 7 x 10(2) S m(-1). (C) 2003 Elsevier B.V. All rights reserved.
引用
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页码:29 / 38
页数:10
相关论文
共 30 条
[11]   INDUSTRIAL DEPOSITION OF BINARY, TERNARY, AND QUATERNARY NITRIDES OF TITANIUM, ZIRCONIUM, AND ALUMINUM [J].
KNOTEK, O ;
MUNZ, WD ;
LEYENDECKER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2173-2179
[12]   NUCLEATION AND GROWTH IN TIO2 FILMS PREPARED BY SPUTTERING AND EVAPORATION [J].
LOBL, P ;
HUPPERTZ, M ;
MERGEL, D .
THIN SOLID FILMS, 1994, 251 (01) :72-79
[13]  
MAHAN JE, 2000, PHYS VAPOR DEPOSITIO, P97
[14]   Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique [J].
Martin, N ;
Banakh, O ;
Santo, AME ;
Springer, S ;
Sanjinés, R ;
Takadoum, J ;
Lévy, F .
APPLIED SURFACE SCIENCE, 2001, 185 (1-2) :123-133
[15]   Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique [J].
Martin, N ;
Sanjinés, R ;
Takadoum, J ;
Lévy, F .
SURFACE & COATINGS TECHNOLOGY, 2001, 142 :615-620
[16]  
MARTIN N, 1997, THESIS U FRANCHE COM
[17]   A new layer system of anti-reflective coating for cathode ray tubes [J].
Oyama, T ;
Ohsaki, H ;
Tachibana, Y ;
Hayashi, Y ;
Ono, Y ;
Horie, N .
THIN SOLID FILMS, 1999, 351 (1-2) :235-240
[18]   SURFACE SENSITIVITY OF SION INTEGRATED OPTICAL WAVE-GUIDES (IOWS) EXAMINED BY IOW ATTENUATED TOTAL-REFLECTION SPECTROMETRY AND IOW RAMAN-SPECTROSCOPY [J].
PLOWMAN, TE ;
GARRISON, MD ;
WALKER, DS ;
REICHERT, WM .
THIN SOLID FILMS, 1994, 243 (1-2) :610-615
[19]   Local structure and bonds of amorphous silicon oxynitride thin films [J].
Scopel, WL ;
Fantini, MCA ;
Alayo, MI ;
Pereyra, I .
THIN SOLID FILMS, 2002, 413 (1-2) :59-64
[20]   Reactively sputter-deposited Mo-Ox-Ny thin films [J].
Shen, YG ;
Mai, YW .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 95 (03) :222-229