Defect properties and p-type doping efficiency in phosphorus-doped ZnO

被引:187
作者
Lee, WJ [1 ]
Kang, J [1 ]
Chang, KJ [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
关键词
D O I
10.1103/PhysRevB.73.024117
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Based on first-principles pseudopotential calculations, we investigated the electronic structure of various P-related defects in ZnO and the p-type doping efficiency for two forms of P dopant sources such as P2O5 and Zn3P2. As compared to N dopants, a substitutional P at an O site has a higher ionization energy of about 0.62 eV, which makes it difficult to achieve p-type ZnO. Under Zn-rich growth conditions, P-O acceptors are compensated by dominant donors such as P-Zn, leading to n-type conduction. Although a P-Zn-2V(Zn) complex, which consists of a substitutional P at a Zn antisite and two Zn vacancies, acts as an acceptor, the formation of Zn vacancies is more probable on going to O-rich conditions for the dopant source using P2O5. On the other hand, when Zn3P2 is used as the P dopant source, the P-Zn-2V(Zn) complex is energetically more favorable and becomes the dominant acceptor under O-rich growth conditions.
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页数:6
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