Dielectric and optical properties of epitaxial rare-earth scandate films and their crystallization behavior

被引:76
作者
Christen, H. M. [1 ]
Jellison, G. E., Jr.
Ohkubo, I.
Huang, S.
Reeves, M. E.
Cicerrella, E.
Freeouf, J. L.
Jia, Y.
Schlom, D. G.
机构
[1] Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA
[2] Univ Tokyo, Dept Appl Chem, Sch Engn, Tokyo 1138656, Japan
[3] George Washington Univ, Dept Phys, Washington, DC 20052 USA
[4] Portland State Univ, Dept Phys, Portland, OR 97207 USA
[5] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2213931
中图分类号
O59 [应用物理学];
学科分类号
摘要
Rare-earth scandates (ReScO3, with Re=Y, La, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu, i.e., the entire series for which the individual oxides are chemically stable in contact with Si) were deposited in a temperature-gradient pulsed laser deposition system onto LaAlO3 substrates. The crystallization temperature depends monotonically on the Re atomic number and the Goldschmidt tolerance factor, with crystallization temperatures as low as 650 degrees C for LaScO3 and PrScO3. The dielectric constants of the crystalline films K approximate to 30 (determined by microwave microscopy) are significantly larger than those of their amorphous counterparts. In combination with the large observed band gaps (E-g > 5.5 eV, determined by ellipsometry), these results indicate the potential of these materials as high-K dielectrics for field-effect transistor applications. (c) 2006 American Institute of Physics.
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页数:3
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