Intrinsic data retention in nanoscaled phase-change memories - Part I: Monte Carlo model for crystallization and percolation

被引:68
作者
Russo, Ugo [1 ]
Ielmini, Daniele
Redaelli, Andrea
Lacaita, Andrea L.
机构
[1] Politecn Milan, Dipartimento Elettron & Informaz, I-20133 Milan, Italy
[2] Politecn Milan, Italian Univ Nanoelect Team, I-20133 Milan, Italy
[3] CNR, IFN, Sez Politecn Milan, I-20133 Milan, Italy
关键词
amorphous semiconductors; chalcogenide; crystal growth; nonvolatile memories; phase-change memory (PCM);
D O I
10.1109/TED.2006.885527
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The amorphous phase of chalcogenide material in phase-change memories (PCMs) is subjected to spontaneous and thermal-activated crystallization. This represents a critical reliability issue and has to be carefully investigated and modeled for physically based projection of retention failure up to ten years. A new three-dimensional percolation model describing the statistical crystallization behavior in an intrinsic PCM cell for the amorphous state is developed. With this physical model, the authors were able to calculate the resistance evolution with time in the cell and the statistical distribution of retention failure times in a cell array. from the impact of geometrical parameters on the cell retention performance, PCM design guidelines to minimize data-loss effects can be obtained. The model allows the evaluation of nucleation and growth parameters and statistical extrapolations of intrinsic retention failure, which will be shown in Part 2.
引用
收藏
页码:3032 / 3039
页数:8
相关论文
共 21 条
[11]  
LAI S, 2001, IEDM, P803
[12]  
Pellizzer F, 2004, 2004 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P18
[13]  
PENG C, 1999, J APPL PHYS, V82, P4183
[14]   Reliability study of phase-change nonvolatile memories [J].
Pirovano, A ;
Redaelli, A ;
Pellizzer, F ;
Ottogalli, F ;
Tosi, M ;
Ielmini, D ;
Lacaita, AL ;
Bez, R .
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2004, 4 (03) :422-427
[15]   Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials [J].
Pirovano, A ;
Lacaita, AL ;
Pellizzer, F ;
Kostylev, SA ;
Benvenuti, A ;
Bez, R .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (05) :714-719
[16]   Electronic switching in phase-change memories [J].
Pirovano, A ;
Lacaita, AL ;
Benvenuti, A ;
Pellizzer, F ;
Bez, R .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (03) :452-459
[17]  
Redaelli A, 2005, INT EL DEVICES MEET, P761
[18]   Intrinsic data retention in nanoscaled phase-change memories - Part II: Statistical analysis and prediction of failure time [J].
Redaelli, Andrea ;
Ielmini, Daniele ;
Russo, Ugo ;
Lacaita, Andrea L. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (12) :3040-3046
[19]   Models for phase-change of Ge2Sb2Te5 in optical and electrical memory devices [J].
Senkader, S ;
Wright, CD .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (02) :504-511
[20]   Percolation models for gate oxide breakdown [J].
Stathis, JH .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (10) :5757-5766