Simultaneous microRaman and synchrotron radiation microdiffraction: Tools for materials characterization

被引：22

作者：

Davies, RJ ^{[1
]}

Burghammer, M ^{[1
]}

Riekel, C ^{[1
]}

机构：

[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France

来源：

APPLIED PHYSICS LETTERS | 2005年 / 87卷 / 26期

关键词：

D O I：

10.1063/1.2159087

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

MicroRaman (mu Raman) and x-ray microdiffraction (mu XRD) are complementary techniques, ideally suited to simultaneous combination. They provide quite different structural information, across a range of different length scales. This letter reports on a simultaneous mu Raman/mu XRD experiment. The laser and x-ray beams are delivered coaxially and simultaneously to the same point on the sample. To demonstrate the technical capabilities of the system, data are presented from a structured silicon/tantalum sample. The distributions of Si and Ta are given by the intensities of the 520 cm(-1) Raman band and the 002 reflection of the Ta beta-phase, respectively. The combination of these two techniques is a powerful tool for materials characterization.

引用

页码：1 / 3

页数：3

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