X-ray diffraction studies of porous silicon

被引:83
作者
Bellet, D
Dolino, G
机构
[1] Lab. de Spectrométrie Phys., Univ. Joseph Fourier-Grenoble I, F-38402 Saint-Martin d'Heres Cedex
关键词
nanostructures; silicon; surface stress; X-ray diffraction;
D O I
10.1016/0040-6090(95)08035-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We review previous X-ray diffraction experiments on porous silicon, giving a determination of porous layer strain. The results of our X-ray measurements of the strain of as-formed and anodically oxidized samples are presented; the diffraction curves of thin layers and of superlattices and the strain induced by liquid wetting and vapour adsorption have been measured. The size and shape of silicon crystallites can be determined from the X-ray diffraction pattern, in particular by using reciprocal space maps.
引用
收藏
页码:1 / 6
页数:6
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