Variation of GaN valence bands with biaxial stress and quantification of residual stress

被引:49
作者
Edwards, NV
Yoo, SD
Bremser, MD
Weeks, TW
Nam, OH
Davis, RF
Liu, H
Stall, RA
Horton, MN
Perkins, NR
Kuech, TF
Aspnes, DE
机构
[1] EMCORE CORP,SOMERSET,NJ 08873
[2] UNIV WISCONSIN,DEPT CHEM ENGN,MADISON,WI 53706
[3] N CAROLINA STATE UNIV,DEPT PHYS,RALEIGH,NC 27695
关键词
D O I
10.1063/1.119089
中图分类号
O59 [应用物理学];
学科分类号
摘要
Low-temperature reflectance data on epitaxial GaN thin-him samples covering the widest range of tensile and compressive stress (-3.8-3.5 kbar) thus far explicitly show the nonlinear behavior of the B-A and C-A splittings versus the energy of the A exciton. Lineshape ambiguities that hindered previous interpretations have been resolved with reciprocal-space analysis, allowing us to obtain band parameters such as Delta(SO) = 17.0 +/- 1 meV with increased confidence. (C) 1997 American Institute of Physics.
引用
收藏
页码:2001 / 2003
页数:3
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