Features of the α-γ transition in a low-pressure rf argon discharge

被引:29
作者
Lisovskii, VA [1 ]
机构
[1] Kharkov State Univ, UA-310077 Kharkov, Ukraine
关键词
D O I
10.1134/1.1259033
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is found that the region for the stable existence of the cu regime of a radio-frequency (rf) discharge is bounded not only on the moderate-pressure side, but also on the low-pressure side. One feature of the alpha - gamma transition in a low-pressure rf discharge is that the criterion for breakdown of the electrode sheath is not satisfied. It is shown that at low pressures the alpha - gamma transition of an rf argon discharge takes place abruptly and exhibits hysteresis. At intermediate pressures the alpha - gamma transition is continuous and lacks jumps; negative differential conductivity appears, double layers form, and nonmonotonic behavior of the plasma density is observed at the center of the discharge. The role of stochastic (collisionless) electron healing in sustaining an rf discharge at intermediate gas pressures is discussed. (C) 1998 American Institute of Physics. [S1063-7842(98)01005-8].
引用
收藏
页码:526 / 534
页数:9
相关论文
共 44 条
[1]   POWER DISSIPATION IN CAPACITIVELY COUPLED RF DISCHARGES [J].
BENEKING, C .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (09) :4461-4473
[2]   SPATIALLY RESOLVED OPTICAL-EMISSION AND ELECTRICAL-PROPERTIES OF SIH4 RF DISCHARGES AT 13.56 MHZ IN A SYMMETRICAL PARALLEL-PLATE CONFIGURATION [J].
BOHM, C ;
PERRIN, J .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1991, 24 (06) :865-881
[3]  
Budyanskii A. M., 1992, Soviet Technical Physics Letters, V18, P6
[4]   SOME CHEMICAL ASPECTS OF THE FLUOROCARBON PLASMA ETCHING OF SILICON AND ITS COMPOUNDS [J].
COBURN, JW ;
KAY, E .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) :33-41
[5]  
DUDIN SV, 1994, PRIB TEKH EKSP, P78
[6]  
DUDIN SV, 1996, 23 IEEE INT C PLASM, P45
[7]   POSITIVE-ION RATIO MEASUREMENTS IN AR, KR, AND XE GLOW DISCHARGES [J].
FITZWILS.RL ;
CHANIN, LM .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (12) :5337-5346
[8]   BASIC CHEMISTRY AND MECHANISMS OF PLASMA-ETCHING [J].
FLAMM, DL ;
DONNELLY, VM ;
IBBOTSON, DE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01) :23-30
[9]  
Godyak V. A., 1976, Fizika Plazmy, V2, P141
[10]   ION-BOMBARDMENT SECONDARY-ELECTRON MAINTENANCE OF STEADY RF DISCHARGE [J].
GODYAK, VA ;
KHANNEH, AS .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) :112-123