Dissolution/swelling behavior of cycloolefin polymers in aqueous base

被引:43
作者
Ito, H [1 ]
Allen, RD [1 ]
Opitz, J [1 ]
Wallow, TI [1 ]
Truong, HD [1 ]
Hofer, DC [1 ]
Varanasi, PR [1 ]
Jordhamo, GM [1 ]
Jayaraman, S [1 ]
Vicari, R [1 ]
机构
[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
来源
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷
关键词
polycycloolefins; norbornenes; dissolution; swelling; quartz crystal microbalance; dissolution modifying agents; hydrolysis; norbornene-maleic anhydride copolymers; charge transfer polymerization;
D O I
10.1117/12.388254
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Polycycloolefins prepared by addition polymerization of norbornene derivatives are quite different from hydroxystyrene-based polymers in terms of their interaction with aqueous base. Their dissolution kinetics monitored on a quartz crystal microbalance is not a smooth function of the ratio of the polar to nonpolar functionalities in polymer but abruptly changes from very fast dissolution to massive swelling within a narrow range of composition. The maximum swelling is a function of thickness and the entire film thickness can swell in a few seconds at >3,000 Angstrom/sec or at immeasurably fast rates. The initial concentration of a pendant carboxylic acid in polymer has to be selected to minimize swelling and the concentration of an acid-labile group to induce fast dissolution in the exposed area. Furthermore, swelling which occurs in the partially-exposed regions must be minimized by incorporating a third monomer unit or by adding a dissolution modifying agent (DMA) such as t-butyl cholate. However, the function of DMA which is also acid-labile is quite complex; depending on the matrix polymer composition and its dissolution/swelling behavior, DMA could function as a swelling suppressor or promoter and a carboxylic acid generated by acidolysis of DMA as a dissolution or swelling promoter. Photochemically generated sulfonic acid could also affect the dissolution/swelling behavior. Base hydrolysis of anhydride during development is controlled by the polarity (carboxylic acid concentration) in polymer film, which has been demonstrated in an unequivocal fashion by IR spectroscopy under the condition strongly mimicking the development process and thus could boost development contrast but could hurt performance as well. Thus, incorporation of carboxylic acid in the form of methacrylic acid, for example, in radical copolymerization of norbornene with maleic anhydride must be handled carefully as it would increase the susceptibility of the anhydride hydrolysis and could introduce heterogeneity in the polymer as methacrylic acid is rapidly consumed, producing a terpolymer containing a different molar concentration of norbornene and maleic anhydride (a proof against the commonly believed charge trans-fer polymerization mechanism).
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页码:2 / 12
页数:3
相关论文
共 20 条
[1]  
ALLEN RD, 1995, P SOC PHOTO-OPT INS, V2438, P474, DOI 10.1117/12.210396
[2]   Protecting groups for 193-nm photoresists [J].
Allen, RD ;
Sooriyakumaran, R ;
Opitz, J ;
Wallraff, GM ;
DiPietro, RA ;
Breyta, G ;
Hofer, DC ;
Kunz, RR ;
Jayaraman, S ;
Shick, R ;
Goodall, B ;
Okoroanyanwu, U ;
Willson, CG .
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIII, 1996, 2724 :334-343
[3]  
CHOI SJ, 1997, J PHOTOPOLYM SCI TEC, V10, P521
[4]   Lithographic performance of a dry-etch stable methacrylate resist at 193 nm [J].
Dammel, RR ;
Ficner, S ;
Oberlander, J ;
Klauck-Jacobs, A ;
Padmanaban, M ;
Khanna, DN ;
Durham, DL .
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2, 1998, 3333 :144-151
[5]  
HOULIHAN FM, 1997, J PHOTOPOLYM SCI TEC, V10, P511
[6]   NMR analysis of chemically amplified resist films [J].
Ito, H ;
Sherwood, M .
MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 :104-115
[7]   Dissolution behavior of phenolic resins and resists as studied by quartz crystal microbalance [J].
Ito, H ;
FenzelAlexander, D ;
Breyta, G .
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 :575-584
[8]  
ITO H, 1996, SOLID STATE TECHNOL, V36, P164
[9]  
ITO H, 2000, IN PRESS POLYM PREPR, V40
[10]  
ITO H, UNPUB MACROMOLECULES