Highly ordered arrays of In(Ga)As quantum dots on patterned GaAs(001) substrates

被引:64
作者
Heidemeyer, H [1 ]
Müller, C [1 ]
Schmidt, OG [1 ]
机构
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
关键词
nanostructures; patterned substrate; molecular beam epitaxy; semiconducting III-V materials;
D O I
10.1016/j.jcrysgro.2003.09.030
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have overgrown GaAs (0 0 1) substrates, patterned with dense square arrays of round-shaped nanometer-sized holes, with GaAs and In(Ga)As. For GaAs overgrowth, the initial holes transform into larger well-defined multicornered holes. A subsequent deposition of InGaAs or InAs onto this template causes the formation of an ordered array of laterally closely spaced In(Ga)As quantum dots (QDs)-termed QD molecules. For GaAs buffer layers thicker than 18 monolayer, the QD molecules tend to align in [1 1 0] direction. On the other hand, if we overgrow the patterned hole array directly with InGaAs, we observe the formation of [(1) over bar 1 0]-aligned QD molecules. Overgrowth of such QD molecule arrays. with a Ga(Al)As spacer and, a second InGaAs QD layer results in the formation of about 1 million perfectly site-controlled InGaAs QDs. Furthermore, we investigate the photoluminescence property of a vertically and laterally aligned InAs QD array and simulate the strain energy density distribution generated by the buried QDs. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:444 / 449
页数:6
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