Density measurement of a thin-film by the pressure-of-flotation method

被引：8

作者：

Waseda, A ^{[1
]}

Fujii, K ^{[1
]}

Taketoshi, N ^{[1
]}

机构：

[1] NMIJ, Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki, Japan

来源：

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT | 2005年 / 54卷 / 02期

关键词：

Avogadro constant; density; pressure-of-flotation method (PFM); silicon crystal; thickness; thin-film;

D O I：

10.1109/TIM.2005.843523

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The pressure-of-flotation apparatus for density comparison has been improved in temperature control. A new method for density and thickness measurements of a thin-film is proposed by a pressure-of-flotation method (PFM). The density and thickness of a molybdenum thin-film prepared on a silicon substrate by a sputtering technique are evaluated by measuring the density and mass differences of a silicon substrate with and without the thin-film. The estimated density of the molybdenum film is (7890 +/- 300) kg/m(3), which is smaller than that of bulk molybdenum. The average thickness of the thin-film is calculated to be (12.08 +/- 0.49) nm. Details on the density and thickness measurement of a thin-film and the results of the measurement are presented.

引用

页码：882 / 885

页数：4

共 6 条

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