Preparation of scandium aluminum nitride thin films by using scandium aluminum alloy sputtering target and design of experiments

被引:65
作者
Akiyama, Morito [1 ]
Tabaru, Tatsuo [1 ]
Nishikubo, Keiko [1 ]
Teshigahara, Akihiko [2 ]
Kano, Kazuhiko [2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Measurement Solut Res Ctr, Saga 8410052, Japan
[2] DENSO CORP, Res Labs, Aichi 4700111, Japan
关键词
ScAlN thin films; ScAl alloy target; Sputtering; Design of experiments; Piezoelectric constant; PIEZOELECTRIC RESPONSE; PZT FILMS; TEMPERATURE; ZINCBLENDE; DEPOSITION; ALN;
D O I
10.2109/jcersj2.118.1166
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
081705 [工业催化]; 082905 [生物质能源与材料];
摘要
Scandium aluminum nitride alloy (ScxAl1-xN) thin films were prepared using rf magnetron sputtering with a scandium aluminum alloy (Sc0.42Al0.58) target on n-type (100) silicon substrates. We have investigated the effects of 4 sputtering control factors, which are substrate temperature, sputtering pressure, nitrogen (N-2) concentration and cathode power, on the piezoelectric constant d(33) of ScxAl1-xN films using design of experiments. Consequently, it is statistically proved that N-2 concentration in sputtering gas is the most important control factor. The piezoelectric constant d(33) indicates the maximum value of 19.0 pC/N at N-2 concentration of 25%. The composition of ScxAl1-xN films prepared under optimized sputtering conditions is Sc0.38Al0.62N, and there is the composition difference between the ScAl alloy target and the thin film. However, the piezoelectric constant of the Sc0.38Al0.62N film is coincident with that of Sc0.38Al0.62N films prepared by dual co-sputtering. Thus, it is possible to prepare high piezoelectric ScxAl1-xN films by using the ScAl alloy sputtering target. ScAl alloy targets are effective for keeping scandium concentration constant in ScxAl1-xN thin films. (C) 2010 The Ceramic Society of Japan. All rights reserved.
引用
收藏
页码:1166 / 1169
页数:4
相关论文
共 24 条
[1]
BASAL ORIENTATION ALUMINUM NITRIDE GROWN AT LOW-TEMPERATURE BY RF DIODE SPUTTERING [J].
AITA, CR .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) :1807-1808
[2]
Statistical approach for optimizing sputtering conditions of highly oriented aluminum nitride thin films [J].
Akiyama, M ;
Xu, CN ;
Nonaka, K ;
Shobu, K ;
Watanabe, T .
THIN SOLID FILMS, 1998, 315 (1-2) :62-65
[3]
Preparation of highly oriented AlN thin films on glass substrates by helicon plasma sputtering and design of experiments [J].
Akiyama, M ;
Harada, T ;
Xu, CN ;
Nonaka, K ;
Watanabe, T .
THIN SOLID FILMS, 1999, 350 (1-2) :85-90
[4]
Influence of growth temperature and scandium concentration on piezoelectric response of scandium aluminum nitride alloy thin films [J].
Akiyama, Morito ;
Kano, Kazuhiko ;
Teshigahara, Akihiko .
APPLIED PHYSICS LETTERS, 2009, 95 (16)
[5]
Enhancement of Piezoelectric Response in Scandium Aluminum Nitride Alloy Thin Films Prepared by Dual Reactive Cosputtering [J].
Akiyama, Morito ;
Kamohara, Toshihiro ;
Kano, Kazuhiko ;
Teshigahara, Akihiko ;
Takeuchi, Yukihiro ;
Kawahara, Nobuaki .
ADVANCED MATERIALS, 2009, 21 (05) :593-+
[6]
Piezoelectric response of thin films determined by charge integration technique: Substrate bending effects [J].
Barzegar, A ;
Damjanovic, D ;
Ledermann, N ;
Muralt, P .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (08) :4756-4760
[7]
Dismukes J. P., 1972, Journal of Crystal Growth, V13-14, P365, DOI 10.1016/0022-0248(72)90185-6
[8]
Microstructure and electronic properties of the refractory semiconductor ScN grown on Mg0(001) by ultra-high-vacuum reactive magnetron sputter deposition [J].
Gall, D ;
Petrov, I ;
Madsen, LD ;
Sundgren, JE ;
Greene, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04) :2411-2417
[9]
Wurtzite structure Sc1-xAlxN solid solution films grown by reactive magnetron sputter epitaxy: Structural characterization and first-principles calculations [J].
Hoglund, Carina ;
Birch, Jens ;
Alling, Bjorn ;
Bareno, Javier ;
Czigany, Zsolt ;
Persson, Per O. A. ;
Wingqvist, Gunilla ;
Zukauskaite, Agne ;
Hultman, Lars .
JOURNAL OF APPLIED PHYSICS, 2010, 107 (12)
[10]
Cubic Sc1-xAlxN solid solution thin films deposited by reactive magnetron sputter epitaxy onto ScN(111) [J].
Hoglund, Carina ;
Bareno, Javier ;
Birch, Jens ;
Alling, Bjorn ;
Czigany, Zsolt ;
Hultman, Lars .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (11)