Enhancement of Piezoelectric Response in Scandium Aluminum Nitride Alloy Thin Films Prepared by Dual Reactive Cosputtering

被引:767
作者
Akiyama, Morito [1 ]
Kamohara, Toshihiro [1 ]
Kano, Kazuhiko [2 ]
Teshigahara, Akihiko [2 ]
Takeuchi, Yukihiro [2 ]
Kawahara, Nobuaki [2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Measurement Solut Res Ctr, Saga 8410052, Japan
[2] DENSO CORP, Res Labs, Aichi 4700111, Japan
关键词
TEMPERATURE; GROWTH; SCXGA1-XN;
D O I
10.1002/adma.200802611
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A high-temperature piezoelectric material exhibits a good balance between high maximum use temperature and large piezoelectricity. This is achieved by the combination of the discovery of a phase transition in scandium aluminum nitride (Sc(x)Al(1-x)N) alloy thin films, and the use of dual cosputtering, which leads to non-equilibrium alloy thin films.
引用
收藏
页码:593 / +
页数:5
相关论文
共 24 条
[1]   Preparation of highly oriented AlN thin films on glass substrates by helicon plasma sputtering and design of experiments [J].
Akiyama, M ;
Harada, T ;
Xu, CN ;
Nonaka, K ;
Watanabe, T .
THIN SOLID FILMS, 1999, 350 (1-2) :85-90
[2]   Piezoelectricity of ordered (ScxGa1-xN) alloys from first principles [J].
Alsaad, A. ;
Ahmad, A. .
EUROPEAN PHYSICAL JOURNAL B, 2006, 54 (02) :151-156
[3]   Evaluation of langasite (La3Ga5SiO14) as a material for high temperature microsystems [J].
Ansorge, Erik ;
Schimpf, Stefan ;
Hirsch, Soeren ;
Sauerwald, Jan ;
Fritze, Holger ;
Schmidt, Bertram .
SENSORS AND ACTUATORS A-PHYSICAL, 2006, 130 :393-396
[4]   ScGaN alloy growth by molecular beam epitaxy: Evidence for a metastable layered hexagonal phase [J].
Constantin, C ;
Al-Brithen, H ;
Haider, MB ;
Ingram, D ;
Smith, AR .
PHYSICAL REVIEW B, 2004, 70 (19) :1-4
[5]  
Corso A.D., 1994, Phys. Rev. B, V50, P10715
[6]   Properties of hexagonal ScN versus wurtzite GaN and InN [J].
Farrer, N ;
Bellaiche, L .
PHYSICAL REVIEW B, 2002, 66 (20) :2012031-2012034
[7]   High-quality growth of AlN epitaxial layer by plasma-assisted molecular-beam epitaxy [J].
Jeganathan, K ;
Kitamura, T ;
Shimizu, M ;
Okumura, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2002, 41 (1AB) :L28-L30
[8]   Growth of La3-xBaxTa0.5+x/2Ga5.5-x/2O14 compounds for the high-temperature piezoelectric applications [J].
Jung, HI ;
Yang, WJ ;
Yoshikawa, A ;
Fukuda, T ;
Auh, KH .
JOURNAL OF CRYSTAL GROWTH, 2004, 262 (1-4) :40-47
[9]   Band-gap engineering in sputter-deposited ScxGa1-xN [J].
Little, ME ;
Kordesch, ME .
APPLIED PHYSICS LETTERS, 2001, 78 (19) :2891-2892
[10]   Thickness dependence of the properties of highly c-axis textured AlN thin films [J].
Martin, F ;
Muralt, P ;
Dubois, MA ;
Pezous, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (02) :361-365