Band-gap engineering in sputter-deposited ScxGa1-xN

被引:93
作者
Little, ME [1 ]
Kordesch, ME [1 ]
机构
[1] Ohio Univ, Dept Phys & Astron, Condensed Matter & Surface Sci Program, Athens, OH 45701 USA
关键词
D O I
10.1063/1.1370548
中图分类号
O59 [应用物理学];
学科分类号
摘要
Reactive sputtering was used to grow thin films of ScxGa1-xN with scandium concentration of 20%-70% on quartz substrates at temperatures of 300-675 K. X-ray diffraction (XRD) of the films showed either weak or no structure, suggesting the films are amorphous or microcrystalline. Optical absorption spectra were taken of each sample and the optical band gap was determined. The band gap varied linearly with composition between 2.0 and 3.5 eV. ScN and GaN have different crystal structures (rocksalt and wurzite, respectively), and thus may form a heterogeneous mixture as opposed to an alloy. Since the XRD data were inconclusive, bilayers of ScN/GaN were grown and optical absorption spectra taken. A fundamental difference in the spectra between the bilayer films and alloy films was seen, suggesting the films are alloys not heterogeneous mixtures. (C) 2001 American Institute of Physics.
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页码:2891 / 2892
页数:2
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