On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

被引：48

作者：

Kim, DH

Lin, ZQ

Kim, HC

Jeong, U

Russell, TP ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Polymer Sci & Engn, Silvio O Conte Natl Ctr Polymer Res, Amherst, MA 01003 USA

[2] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

[3] Pohang Univ Sci & Technol, Dept Chem Engn, Kyongbuk 790784, South Korea

[4] Pohang Univ Sci & Technol, Polymer Res Inst, Kyongbuk 790784, South Korea

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 10期

关键词：

D O I：

10.1002/adma.200304581

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Both positive and negative replicas of copolymer arrays are produced using crosslinked poly(dimethylsiloxane). Negative replicas of the nanoscopic features are manufactued by entrapping air within the microdomains. Positive replicas are produced with similar to1:1 aspect ratios by the PDMS filling the nanoscopic, cylincrical cavities. The Figure shows an AFM image of a negative replica (size: 2 mum x 2 mum, inset: Fourier transform of image).

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页码：811 / +

页数：5

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