Reflectionless tunneling in planar Nb/GaAs hybrid junctions

被引:13
作者
Giazotto, F
Cecchini, M
Pingue, P
Beltram, F
Lazzarino, M
Orani, D
Rubini, S
Franciosi, A
机构
[1] Scuola Normale Super Pisa, I-56126 Pisa, Italy
[2] Ist Nazl Fis Mat, I-56126 Pisa, Italy
[3] INFM, Lab Nazl TASC, Area Ric, I-34012 Trieste, Italy
[4] Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland
[5] Univ Trieste, Dipartmento Fis, I-34127 Trieste, Italy
关键词
D O I
10.1063/1.1357211
中图分类号
O59 [应用物理学];
学科分类号
摘要
Reflectionless tunneling was observed in Nb/GaAs superconductor/semiconductor junctions fabricated by a two-step procedure. First, periodic delta -doped layers were grown by molecular-beam epitaxy near the GaAs surface, followed by an As cap layer to protect the surface during ex situ transfer. Second, Nb was deposited by dc-magnetron sputtering onto a GaAs(001) 2 x 4 surface in situ after thermal desorption of the cap layer. The magnetotransport behavior of the resulting hybrid junctions was successfully analyzed within the random matrix theory of phase-coherent Andreev transport. The impact of junction morphology on reflectionless tunneling and the applicability of the fabrication technique to the realization of complex superconductor/semiconductor mesoscopic systems are discussed. (C) 2001 American Institute of Physics.
引用
收藏
页码:1772 / 1774
页数:3
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