A new measurement and treatment for kinetics of isothermal oxidation of Si3N4

被引：39

作者：

Hou, Xin-mei ^{[1
]}

Chou, Kuo-chih ^{[1
]}

Hu, Xiao-jun ^{[1
]}

Zhao, Hai-lei ^{[1
]}

机构：

[1] Univ Sci & Technol Beijing, Dept Phys Chem, Beijing 100083, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2008年 / 459卷 / 1-2期

关键词：

oxidation; isothermal kinetics; nitride materials; ceramics;

D O I：

10.1016/j.jallcom.2007.04.255

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The kinetics of the oxidation Of alpha-Si3N4 powder has been investigated in the temperature range from 1373 to 1573 K experimentally in the air by using thermogravimetry. The results show that the major oxidation product was crystalline SiO2 and the oxidation reaction was mainly diffusion-controlled. Based on the experiment data, the new model for predicting the isothermal oxidation process of alpha-Si3N4 powder has been used, which offers an analytic form expressing the oxidation weight gain as a function of time and temperature explicitly. The comparison between experimental data and theoretical calculation shows that this new model works very well. Based on our model the activation energy for the oxidation Of alpha-Si3N4 has been calculated to be 325.6 kJ/mol. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：123 / 129

页数：7

共 18 条

[1]

BISWAS SK, 1994, KEY ENG MAT, V89-9, P271

[2] A kinetic model for oxidation of Si-Al-O-N materials [J].

Chou, KC .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2006, 89 (05) :1568-1576

[3] Kinetics of absorption and desorption of hydrogen in alloy powder [J].

Chou, KC ;

Li, Q ;

Lin, Q ;

Jiang, LJ ;

Xu, KD .

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2005, 30 (03) :301-309

[4] KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE CONTAINING MAGNESIA [J].

CUBICCIOTTI, D ;

LAU, KH .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1978, 61 (11-1) :512-517

[5] THERMODYNAMICS OF THE SI-N-O SYSTEM AND KINETIC MODELING OF OXIDATION OF SI3N4 [J].

DU, HH ;

TRESSLER, RE ;

SPEAR, KE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (11) :3210-3215

[6] OXIDATION STUDIES OF CRYSTALLINE CVD SILICON-NITRIDE [J].

DU, HH ;

TRESSLER, RE ;

SPEAR, KE ;

PANTANO, CG .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (05) :1527-1536

[7]

Fang K M, 2003, CHINA PART, V1, P88

[8]

GE CC, 2005, 5 PAC RIM INT C ADV, P1599

[9]

Huang H, 2003, J MATER PROCESS TECH, V141, P329, DOI 10.1016/S0924-0l36(03)00284-X

[10] The sophistication of ceramic science through silicon nitride studies [J].

Lange, Frederick F. .

JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 2006, 114 (1335) :873-879

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