Structural and optical properties of ZnO thin films by rf magnetron sputtering with rapid thermal annealing

被引：37

作者：

Suvorova, N. A. ^{[1
]}

Usov, I. O. ^{[1
]}

Stan, L. ^{[1
]}

DePaula, R. F. ^{[1
]}

Dattelbaum, A. M. ^{[1
]}

Jia, Q. X. ^{[1
]}

Suvorova, A. A. ^{[2
]}

机构：

[1] Los Alamos Natl Lab, Los Alamos, NM 87545 USA

[2] Univ Western Australia, Ctr Microscopy Characterizat & Anal, Crawley, WA 6009, Australia

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 14期

关键词：

D O I：

10.1063/1.2896642

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Epitaxial ZnO thin films were grown on c-plane sapphire substrates by rf magnetron sputtering at room temperature followed by a rapid thermal annealing process. We found that crystallinity of the films was strongly affected by the partial oxygen pressure during deposition. Both x-ray diffraction and transmission electron microscopy studies revealed that the ZnO films grow epitaxially predominantly with aligned ZnO domains. An unresolved excitonic resonance was observed in the optical absorption spectrum. Nevertheless, refractive index and absorption edge of the ZnO films are similar to that of single crystal ZnO. (C) 2008 American Institute of Physics.

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