Relaxation mechanisms in ferroelectric thin film capacitors for FeRAM application

被引:5
作者
Lohse, O [1 ]
Grossmann, M
Bolten, D
Boettger, U
Waser, R
机构
[1] Rhein Westfal TH Aachen, IWE II, Inst Werkstoffe & Elektrotech, D-5100 Aachen, Germany
[2] Forschungszentrum Julich, Inst Festkorperforsch, D-5170 Julich, Germany
关键词
frequency dependence of P-V; ferroelectric relaxation; Curie-von Schweidler;
D O I
10.1080/10584580108222286
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work decided measuring techniques and procedures based on conventional hysteresis measurements and fast pulse characterization are exploited to emphasize the meaning of the ferroelectric relaxation for the fast read and write access of the: memory cell in the time region of several nanoseconds. The dependence of the transient polarization reversal on the measuring frequency, and the voltage pulse pattern is presented for PZT thin film material. In the light of the extracted data the theoretical models of classical ferroelectric phase transition compared to dissipative charge redistribution is discussed.
引用
收藏
页码:39 / 48
页数:10
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