Growth of a textured Pb(Zr0.4Ti0.6)O3 thin film on LaNiO3/Si(001) using pulsed laser deposition

被引：15

作者：

Kim, SS ^{[1
]}

Kim, BI

Park, YB

Kang, TS

Je, JH

机构：

[1] Sunchon Natl Univ, Dept Mat Sci & Met Engn, Sunchon 540742, South Korea

[2] Sunchon Natl Univ, Res & Dev Ctr Automobiles Parts & Mat, Sunchon 540742, South Korea

[3] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea

来源：

APPLIED SURFACE SCIENCE | 2001年 / 169卷

关键词：

LaNiO3 thin film; PZT thin film; ferroelectric thin film; pulsed laser deposition; synchrotron X-ray scattering;

D O I：

10.1016/S0169-4332(00)00736-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The structural characteristics of LaNiO3/Si(0 0 1) films grown by pulsed laser deposition have been studied mainly using a synchrotron X-ray scattering measurement. The films were grown with the (0 0 1) preferred orientation without any alignment in the in-plane direction. The initially unstrained film became strained gradually as it grew further, but its crystalline quality improved significantly. A fully (0 0 1) textured Pb(Zr0.4Ti0.6)O-3 film was successfully grown on such a (0 0 I) textured LaNiO3/Si(0 0 1) substrate as low as 350 degreesC. The nature of structure and microstructure of the Pb(Zr0.4Ti0.6)O-3 film appeared to be similar to that of the underlaying LaNiO3 film. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：553 / 556

页数：4

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