A novel method of fabricating convoluted shaped electrode arrays for neural and retinal prostheses

被引:41
作者
Bhandari, R. [1 ]
Negi, S. [1 ]
Rieth, L. [1 ]
Normann, R. A. [2 ]
Solzbacher, F. [1 ,2 ,3 ]
机构
[1] Univ Utah, Dept Elect & Comp Engn, Salt Lake City, UT 84112 USA
[2] Univ Utah, Dept Bioengn, Salt Lake City, UT USA
[3] Univ Utah, Dept Mat Sci, Salt Lake City, UT USA
关键词
micromachining; electrode arrays; dicing; wet isotropic etching; neural and retinal prostheses;
D O I
10.1016/j.sna.2007.10.072
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel fabrication technique has been developed for creating high density (6.25 electrodes/mm(2)), out-of-plane, high aspect ratio silicon-based convoluted microelectrode arrays for neural and retinal prostheses. The convoluted shape of the surface defined by the tips of the electrodes could compliment the curved surfaces of peripheral nerves and the cortex, and in the case of retina, its spherical geometry. The geometry of these electrode arrays has the potential to facilitate implantation in the nerve fascicles and to physically stabilize it against displacement after insertion. This report presents a unique combination of variable depth dicing and wet isotropic etching for the fabrication of a variety of convoluted neural array geometries. Also, a method of deinsulating the electrode tips using photoresist as a mask and the limitations of this technique on uniformity are discussed. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:123 / 130
页数:8
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