Deposition of indium tin oxide films by laser ablation: Processing and characterization

被引:22
作者
Cali, C
Mosca, M
Targia, G
机构
[1] Univ Palermo, INFM, I-90128 Palermo, Italy
[2] Univ Palermo, Dipartimento Ingn Elettr, I-90128 Palermo, Italy
关键词
D O I
10.1016/S0038-1101(98)00084-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work an indium tin oxide thin film fabrication technique based on pulsed laser deposition is described and the electrical, optical and mechanical properties of the deposited films are reported. Deposition of high quality films on cold substrates was proved. The third harmonic (355 nm) of an Nd:YAG laser was employed to photoablade the indium tin oxide target. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
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页码:877 / 879
页数:3
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