In this work an indium tin oxide thin film fabrication technique based on pulsed laser deposition is described and the electrical, optical and mechanical properties of the deposited films are reported. Deposition of high quality films on cold substrates was proved. The third harmonic (355 nm) of an Nd:YAG laser was employed to photoablade the indium tin oxide target. (C) 1998 Elsevier Science Ltd. All rights reserved.