A-site layer terminated perovskite substrate:: NdGaO3

被引：112

作者：

Ohnishi, T

Takahashi, K

Nakamura, M

Kawasaki, M

Yoshimoto, M

Koinuma, H

机构：

[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[2] Shinkosha Co Ltd, Sakae Ku, Yokohama, Kanagawa 2470007, Japan

[3] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Midori Ku, Yokohama, Kanagawa 2268502, Japan

来源：

APPLIED PHYSICS LETTERS | 1999年 / 74卷 / 17期

关键词：

D O I：

10.1063/1.123888

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A perovskite single-crystal substrate, NdGaO3 (001), was thermally annealed in air to give an atomically defined surface structure. From analysis with coaxial impact-collision ion scattering spectroscopy, the terminating atomic layer was identified to be NdO1+delta, i.e., the A-site oxide monolayer in perovskite ABO(3). This result is contrary to the B-site oxide (BO2-delta) termination observed in other perovskite surfaces, such as wet etched SrTiO3 and LaAlO3 or annealed (LaAlO3)(0.3)-(Sr2AlTaO6)(0.7) (LSAT). (C) 1999 American Institute of Physics. [S0003-6951(99)04217-5].

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页码：2531 / 2533

页数：3

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