Control of gold surface diffusion on Si nanowires

被引:102
作者
den Hertog, Martien I. [1 ]
Rouviere, Jean-Luc [1 ]
Dhalluin, Florian [2 ,3 ]
Desre, Pierre J. [3 ]
Gentile, Pascal [4 ]
Ferret, Pierre [3 ]
Oehler, Fabrice [4 ]
Baron, Thiery [2 ]
机构
[1] CEA Grenoble, CEA, DRFMC, Lab Etud Mat Microscopie Avancee, F-38052 Grenoble 9, France
[2] CEA Grenoble, CNRS, UMR 5129, Lab Technol Microelect, F-38052 Grenoble, France
[3] CEA, DOPT, LETI, Lab Photon Silicium, F-38052 Grenoble 9, France
[4] CEA Grenoble, CEA, DRFMC, Lab Silicium Nanoelect Photon & Struct, F-38052 Grenoble 9, France
关键词
D O I
10.1021/nl073356i
中图分类号
O6 [化学];
学科分类号
0703 [化学];
摘要
Silicon nanowires (NW) were grown by the vapor-liquid-solid mechanism using gold as the catalyst and silane as the precursor. Gold from the catalyst particle can diffuse over the wire sidewalls, resulting in gold clusters decorating the wire sidewalls. The presence or absence of gold clusters was observed either by high angle annular darkfield scanning transmission electron microscopy images or by scanning electron microscopy. We find that the gold surface diffusion can be controlled by two growth parameters, the silane partial pressure and the growth temperature, and that the wire diameter also affects gold diffusion. Gold clusters are not present on the NW side walls for high silane partial pressure, low temperature, and small NW diameters. The absence or presence of gold on the NW sidewall has an effect on the sidewall morphology. Different models are qualitatively discussed. The main physical effect governing gold diffusion seems to be the adsorption of silane on the NW sidewalls.
引用
收藏
页码:1544 / 1550
页数:7
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