Electrochemical behavior of fluorinated boron-doped diamond

被引：22

作者：

Siné, G

Ouattara, L

Panizza, M

Comninellis, C

机构：

[1] Swiss Fed Inst Technol, CH-1015 Lausanne, Switzerland

[2] Univ Cocody, Chim Phys Lab, Abidjan 22, Cote Ivoire

[3] Univ Genoa, Dipartimento Ingn Chim & Proc, I-16129 Genoa, Italy

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2003年 / 6卷 / 09期

关键词：

D O I：

10.1149/1.1592914

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The surface properties and the electrochemical behavior of a fluorinated boron-doped diamond (F-BDD) electrode prepared by plasma treatment in CF4-He mixture has been studied by X-ray photoelectron spectroscopy and cyclic voltammetry in acidic media. The results have shown the presence of carbon-fluorine bonding (C-CF and C-F) on the surface of F-BDD, which made the surface more hydrophobic. It was also found that hydrogen evolution was shifted to more cathodic potentials for fluorinated diamond, as compared with untreated BDD. Finally, the higher cathodic overpotential for hydrogen evolution permitted nickel deposition and nitrate reduction. (C) 2003 The Electrochemical Society.

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页码：D9 / D11

页数：3

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