Design of beamline optics for EUVL

被引：21

作者：

Watanabe, T

Haga, T

Niibe, M

Kinoshita, H

机构：

[1] Himeji Inst Technol, Himeji, Hyogo 67122, Japan

[2] NTT Corp, Syst Elect Labs, Atsugi, Kanagawa 24301, Japan

来源：

JOURNAL OF SYNCHROTRON RADIATION | 1998年 / 5卷

关键词：

extreme-ultraviolet lithography (EUVL); collimating optics; beamline design; toroidal mirrors;

D O I：

10.1107/S0909049597017536

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.

引用

页码：1149 / 1152

页数：4

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