REFLECTIVE SYSTEMS-DESIGN STUDY FOR SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：29

作者：

JEWELL, TE ^{[1
]}

RODGERS, JM ^{[1
]}

THOMPSON, KP ^{[1
]}

机构：

[1] OPT RES ASSOCIATES,PASADENA,CA 91107

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.585108

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have investigated several all-reflective designs which have potential application for soft x-ray projection lithography. The resolution goal for all designs was 0.1-mu-m or better. Different design aspects including usable field size, distortion, obscuration, number of mirrors, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studies were made between three types of systems: strip field scanning systems, and large field nonscanning systems with both curved and flat mask. Several candidate unobscured designs with 0.1-mu-m resolution are presented.

引用

页码：1519 / 1523

页数：5

共 18 条

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