MICROGAP CONTROL IN X-RAY NANOLITHOGRAPHY

被引：8

作者：

MOEL, A

SCHATTENBURG, ML

CARTER, JM

SMITH, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584484

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1692 / 1695

页数：4

共 13 条

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[3] DIMILIA V, 1985, Patent No. 4551192
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[7] A DUAL GRATING ALIGNMENT TECHNIQUE FOR X-RAY-LITHOGRAPHY
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UNE, A
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[8] USE OF A PI-PHASE SHIFTING X-RAY MASK TO INCREASE THE INTENSITY SLOPE AT FEATURE EDGES
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SMITH, HI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 150 - 153
[9] EXPERIMENTAL EVALUATION OF INTERFEROMETRIC ALIGNMENT TECHNIQUES FOR MULTIPLE MASK REGISTRATION
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