Plasma-assisted molecular beam epitaxy of high optical quality MgZnO films on Zn-polar ZnO substrates

被引:49
作者
Nishimoto, Yoshio [1 ]
Nakahara, Ken [1 ]
Takamizu, Daiju [1 ]
Sasaki, Atsushi [1 ]
Tamura, Kentaro [1 ]
Akasaka, Shunsuke [1 ]
Yuji, Hiroyuki [1 ]
Fujii, Tetsuo [1 ]
Tanabe, Tetsuhiro [1 ]
Takasu, Hidemi [1 ]
Tsukazaki, Atsushi [2 ]
Ohtomo, Akira [2 ]
Onuma, Takeyoshi [3 ]
Chichibu, Shigefusa F. [3 ]
Kawasaki, Masashi [2 ,4 ,5 ]
机构
[1] ROHM Co Ltd, Adv Compound Semicond R&D Ctr, Kyoto 6158585, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[3] Tohoku Univ, CANTech, Inst Multidisciplinary Res Adv Mat, Sendai, Miyagi 9808577, Japan
[4] Tohoku Univ, WPI Adv Inst Mat Res AIMR, Sendai, Miyagi 9808577, Japan
[5] Japan Sci & Technol Agcy, CREST, Tokyo 1020075, Japan
关键词
D O I
10.1143/APEX.1.091202
中图分类号
O59 [应用物理学];
学科分类号
摘要
The excellent structural and optical properties of pseudomorphic MgxZn1-xO films (0 <= x <= 0.39) are reported in this work. The MgxZn1-xO films were grown on Zn-polar ZnO substrates by plasma-assisted molecular beam epitaxy. Those MgxZn1-xO films for which x <= 0.18 exhibited atomically flat surfaces, and the typical full-width-at-half-maximum (FWHM) value of the (0002) X-ray diffraction omega-rocking curves for these films was 35 arcsec. The FWHM values were less than 100 meV for the near-band-edge photoluminescence (PL) at 300 K. We observed PL lifetimes of the order of ns, and the longest fast-decay component reached 3.5 ns for the Mg0.12Zn0.88O alloy. (C) 2008 The Japan Society of Applied Physics.
引用
收藏
页码:0912021 / 0912023
页数:3
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