On the correlation between crystallinity of platinum bottom electrode and that of MOD derived PZT thin films

被引：3

作者：

Bao, DH ^{[1
]}

Wu, XQ ^{[1
]}

Zhang, LY ^{[1
]}

Yao, X ^{[1
]}

机构：

[1] Xian Jiao Tong Univ, Elect Mat Res Lab, Xian 710049, Peoples R China

来源：

FERROELECTRICS LETTERS SECTION | 1998年 / 24卷 / 3-4期

关键词：

D O I：

10.1080/07315179808204462

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Growth of well (111)-oriented Pt and Pt/Ti films on SiO2/Si(111) substrates and crystallinity of PZT films grown on the Pt(111)/SiO2/Si(111) and Pt(111)/Ti/SiO2/Si(111) substrates have been investigated. It was found by X-ray diffraction analysis that well (111)-oriented Pt film with a best full-width at half maximum (FWHM) of 0.28 degrees was grown by the DC sputtering method. PZT films were prepared by metallo-organic decomposition(MOD) on Pt(111)-coated SiO2/Si(111) substrates. The crystallinity of the PZT films improved as the FWHM of the Pt(111) diffraction peak decreased. The best FWHM obtained for a PZT film grown on a Pt(111)/Ti/SiO2/Si(111) substrate was 0.33 degrees.

引用

页码：97 / 104

页数：8

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