Self-assembled SiGe quantum rings grown on Si(001) by molecular beam epitaxy

被引:79
作者
Cui, J
He, Q
Jiang, XM
Fan, YL
Yang, XJ
Xue, F
Jiang, ZM [1 ]
机构
[1] Fudan Univ, Surface Phys Lab, Natl Key Lab, Shanghai 200433, Peoples R China
[2] Inst High Energy Phys, BSRF, Beijing 100039, Peoples R China
关键词
D O I
10.1063/1.1616992
中图分类号
O59 [应用物理学];
学科分类号
摘要
SiGe quantum rings (QRs) were grown by partially capping on Ge quantum dots (QDs) on Si(001). Atomic force microscopy images show the shape transformation from QDs to QRs. Initial capping, with a Si layer thickness less than 2 nm, will result in the decrease of height of QDs and increase of base diameter of QDs. Capped with a Si layer, QDs will change into QRs. The mechanism of transformation from QDs to QRs is discussed. The strain will redistribute after capping, thus the strain energy relief, together with high Ge surface diffusion and Ge surface segregation at a relative high temperature of 680 degreesC, play the dominant role. (C) 2003 American Institute of Physics.
引用
收藏
页码:2907 / 2909
页数:3
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