Ultra-deep LIGA process and its applications

被引：14

作者：

Cheng, Y

Shew, BY

Chyu, MK

Chen, PH

机构：

[1] Synchrotron Radiat Res Ctr, Microstruct Grp, Hsinchu 300, Taiwan

[2] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300, Taiwan

[3] Univ Pittsburgh, Dept Mech Engn, Pittsburgh, PA 15261 USA

[4] Natl Taiwan Univ, Dept Engn Mech, Taipei 106, Taiwan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2001年 / 467卷

关键词：

ultra-deep X-ray lithography; thick-film lithography; ultra-deep LIGA process; synchrotron radiation; micromachining;

D O I：

10.1016/S0168-9002(01)00606-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Deep X-ray lithography developed in Germany around the 1980s is an important micromachining technology. Combined with electroplating and molding, this technology can produce micromachining parts with low cost and flexible choices of material. The ultra-deep (UD) LIGA process developed at the Synchrotron Radiation Research Center (SRRC) that provides better development of photoresist is capable of producing microstructures of millimeters in size. The ongoing micromachining projects at SRRC benefited from this UD LIGA process include: microfiber spinneret, leadframe punch. and w-band klystrino. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：1192 / 1197

页数：6

共 8 条

[1] Ultra-deep LIGA process [J].