Effect of complexing agent on the properties of spray-deposited Bi2S3 thin films

被引:12
作者
Gadakh, SR
Killedar, VV
Lokhande, CD
Bhosale, CH [1 ]
机构
[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India
[2] Hahn Meitner Inst Kernforsch Berlin GmbH, D-1000 Berlin, Germany
关键词
Bi2S3; thin films; complexing agents;
D O I
10.1016/S0254-0584(98)00156-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bi2S3 thin films are deposited by a spray pyrolysis technique using oxalic acid as a complexing agent. The films are characterized for their structural, optical and electrical properties. The results are compared with the properties of Bi2S3 thin films produced by the same technique without using the complexing agent. The XRD studies reveal that the growth of the film in a particular direction can be obtained just by controlling the quantity of the complexing agent. The resistivity of complexed films is more than that of as-deposited films. Thermoelectric power (TEP) measurement shows that the carrier concentration and mobility decrease with increasing quantity of oxalic acid. Optical absorption study reveals that the band gap energy, irrespective of the quantity of oxalic acid added to the material, is 1.75 eV. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:79 / 83
页数:5
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