PZT thin films with preferred-orientation induced by external stress

被引：31

作者：

Qin, HX ^{[1
]}

Zhu, JS

Jin, ZQ

Wang, Y

机构：

[1] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China

[2] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China

来源：

THIN SOLID FILMS | 2000年 / 379卷 / 1-2期

关键词：

orientation; stress; PZT film;

D O I：

10.1016/S0040-6090(00)01563-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The microstructure of oriented Pb(Zr0.7Ti0.3)O-3 thin films prepared via the sol-gel method has been carefully investigated. After the precursor was heated, the resultant thin film displayed (100)-preferred orientation because of accumulation of the colloidal particles. X-Ray diffraction (XRD) result indicated that the strong [100]- or [111]-preferred orientation of the PZT thin films could be observed when the substrates slightly bend under appropriate external stresses during annealing procedure. Atomic force microscope (AFM) images revealed that (100)-oriented grains aggregated in some separate zones. The above results can be well explained in the view of internal stress during crystallization. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：72 / 75

页数：4

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