Optimisation of preparative and performance parameters on electrochromic properties of electrochemically deposited tungsten oxide films

被引:14
作者
Hutchins, MG [1 ]
Kamel, NA
El-Kadry, N
Ramadan, AA
Abdel-Hady, K
机构
[1] Minia Univ, Fac Sci, Dept Phys, Menia, Egypt
[2] Oxford Brookes Univ, Sch Engn, Oxford OX3 0BP, England
[3] Helwan Univ, Fac Sci, Dept Phys, Giza, Egypt
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 9A期
关键词
tungsten oxide; electrochromic; electrochemical deposition;
D O I
10.1143/JJAP.37.4812
中图分类号
O59 [应用物理学];
学科分类号
摘要
Tungsten oxide films of 240-1080 nm thickness were deposited on indium tin oxide (ITO) coated glass substrates using an electrochemical deposition technique. All films were amorphous, as proved by X-ray diffraction (XRD), and had an electrical resistivity of 10(6) Ohm.cm and spectral transmittance exceeding 75% in the visible region. The electrochromic (EC) properties were measured in situ during colouration and bleaching cycles. The EC parameters, T-sol(b), T-sol(c), Delta T-sol and Delta(OD)(sol) and the solar colouration efficiency eta(sol) were evaluated at different preparation and performance parameters. The results showed that at small film thickness, the solar colouration efficiency changes linearly and tends toward saturation at larger thickness. At colouration potentials greater than or equal to 2 V, the solar colouration efficiency is almost constant whereas the active sites are transformed to colour centres. In contrast, the efficiency has an exponential dependence on electrolyte concentration. The optimum values are: film thickness = 1080 nm, colouration potential -2 V and electrolyte concentration = 0.4 M. The corresponding EC parameters are: Delta T-sol = 0.458, Delta(OD)(sol) = 0.632 and eta(sol) = 34 cm(2)/C.
引用
收藏
页码:4812 / 4817
页数:6
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