Photo-Cross-Linking-Assisted Thermal Stability of DNA Origami Structures and Its Application for Higher-Temperature Self-Assembly

被引：163

作者：

Rajendran, Arivazhagan ^{[1
,2
]}

Endo, Masayuki ^{[1
,3
]}

Katsuda, Yousuke ^{[2
]}

Hidaka, Kumi ^{[2
]}

Sugiyama, Hiroshi ^{[1
,2
,3
]}

机构：

[1] Japan Sci & Technol Corp JST, CREST, Chiyoda Ku, Tokyo 1020075, Japan

[2] Kyoto Univ, Grad Sch Sci, Dept Chem, Sakyo Ku, Kyoto 6068502, Japan

[3] Kyoto Univ, Inst Integrated Cell Mat Sci iCeMS, Sakyo Ku, Kyoto 6068501, Japan

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2011年 / 133卷 / 37期

关键词：

DUPLEX DNA; PSORALEN; SHAPES; ARRAYS; PHOTOCHEMOTHERAPY; 8-METHOXYPSORALEN; NANOSTRUCTURE; PROTEINS; STRANDS; REPAIR;

D O I：

10.1021/ja204546h

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Heat tolerance of DNA origami structures has been improved about 30 degrees C by photo-cross-linking of 8-methoxypsoralen. To demonstrate one of its applications, the cross-linked origami were used for higher-temperature self-assembly, which markedly increased the yield of the assembled product when compared to the self-assembly of non-cross-linked origami at lower-temperature. By contrast, at higher-temperature annealing, native non-cross-linked tiles did not self-assemble to yield the desired product; however, they formed a nonspecific broken structure.

引用

收藏

页码：14488 / 14491

页数：4

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