High-performance C60 thin-film field-effect transistors with parylene gate insulator

被引:18
作者
Kubozono, Yoshihiro [1 ]
Haas, Simon [2 ]
Kalb, Wolfgang L. [2 ]
Joris, Pierre [2 ]
Meng, Fabian [2 ]
Fujiwara, Akihiko [3 ]
Batlogg, Bertram [2 ]
机构
[1] Okayama Univ, Res Lab Surface Sci, Okayama 7008530, Japan
[2] ETH, Solid State Phys Lab, CH-8093 Zurich, Switzerland
[3] Japan Adv Inst Sci & Technol, Kanazawa, Ishikawa 9231292, Japan
关键词
D O I
10.1063/1.2959819
中图分类号
O59 [应用物理学];
学科分类号
摘要
C-60 field-effect transistors (FETs) have been fabricated with parylene gate dielectric on Si/SiO2, on polyethylene terephthalate, and commercially available transparent sheet substrates. The best performance of the C-60 FET device is achieved with parylene as gate dielectric: field-effect mobility of 0.41 cm(2) V-1 s(-1) and on-off ratio of similar to 10(7). The excellent FET characteristics are recorded without any annealing, and the devices were kept in He atmosphere after an exposure to air. This result suggests the parylene gate dielectric to be highly H2O repellent. The mechanical flexibility and air-exposure effect were studied for the C-60 FET with parylene gate dielectric. (C) 2008 American Institute of Physics.
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页数:3
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