Deposition of molybdenum thin films by an alternate supply of MoCl5 and Zn

被引：41

作者：

Juppo, M ^{[1
]}

Vehkamaki, M ^{[1
]}

Ritala, M ^{[1
]}

Leskela, M ^{[1
]}

机构：

[1] Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 05期

关键词：

D O I：

10.1116/1.581430

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Molybdenum thin films were deposited onto both soda lime glass and Al2O3 film by an alternate supply of MoCl5 and Zn. Zinc was used as a reducing agent. The film growth was performed over a temperature range of 400-500 degrees C in order to study the temperature effect on the growth. In addition to the growth temperature, the purge length after zinc was also seen to have a considerable effect on the growth. The films were analyzed by energy dispersive x-ray spectroscopy, scanning electron microscopy, elastic recoil detection analysis, x-ray diffraction and four point resistance measurements in order to determine their chemical and physical characteristics. (C) 1998 American Vacuum Society. [S0734-2101(98)01405-5].

引用

页码：2845 / 2850

页数：6

共 26 条

[21] ATOMIC LAYER EPITAXY [J].