High performance InP-based heterostructure barrier varactors in single and stack configuration

被引:25
作者
Lheurette, E
Mounaix, P
Salzenstein, P
Mollot, F
Lippens, D
机构
[1] Inst. d'Electron. Microlectron. Nord, U.M.R.-C.N.R.S. 9929, Univ. des Sci. et Technol. de Lille, 59652 Villeneuve d'Ascq, Avenue Poincaré
关键词
varactors; semiconductor diodes; III-V semiconductors;
D O I
10.1049/el:19960893
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Single (SHBV) and dual (DHBV) heterostructure barrier varactors with AlAs/In0.52Al0.48As blocking conduction layers have been fabricated and characterised. The devices, whose electrical properties scale with layer complexity, exhibit, for a DHBV scheme, leakage currents as low as 10 A/cm(2) at 12 V, a zero bias capacitance of 1 fF/mu m(2), and a capacitance ratio of 5:1.
引用
收藏
页码:1417 / 1418
页数:2
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