Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

被引：20

作者：

Kim, Su-Jin ^{[1
]}

Maeng, W. J. ^{[1
]}

Lee, S. K. ^{[1
]}

Park, D. H. ^{[1
]}

Bang, Sung Hwan ^{[1
]}

Kim, Hyungjun ^{[1
]}

Sohn, Byeong-Hyeok ^{[2
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, POSTECH, Pohang 790784, South Korea

[2] Seoul Natl Univ, Dept Chem, Seoul 151742, South Korea

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2008年 / 26卷 / 01期

基金：

新加坡国家研究基金会;

关键词：

D O I：

10.1116/1.2830693

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Nanostructures including nanohole and metal dot arrays were fabricated by hybrid processes combing self-assembled diblock copolymer and conventional semiconductor processes. The interfacial energy between polystyrene-b-polymethylmetacrylate (PS-b-PMMA) diblock copolymer and substrate surface was controlled by employing a self-assembled monolayer (SAM), resulting in a polymer template with well-ordered cylindrical nanohole array. The nanohole sizes were controlled within 10 to 22 nm in diameter using block copolymers with different molecular weights. The PS nanotemplates were fabricated on various substrates, including oxides, nitrides, and poly-Si. Nanohole pattern was transferred by dry etching process, producing inorganic nanohole templates. Also, gold nanodot arrays with diameter smaller than 10 nm were fabricated through lift off process. (c) 2008 American Vacuum Society.

引用

页码：189 / 194

页数：6

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