Effect of LaNiO3/Pt double layers on the characteristics of (PbxLa1-x)(ZryTi1-y)O-3 thin films

被引：43

作者：

Tseng, TF ^{[1
]}

Liu, KS ^{[1
]}

Wu, TB ^{[1
]}

Lin, IN ^{[1
]}

机构：

[1] NATL TSING HUA UNIV,CTR MAT SCI,HSINCHU 300,TAIWAN

来源：

APPLIED PHYSICS LETTERS | 1996年 / 68卷 / 18期

关键词：

D O I：

10.1063/1.115836

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Characteristics of LaNiO3 (LNO) thin films deposited by rf sputtering process were compared with that prepared by pulsed laser deposition (PLD) process, rf sputtered LNO films were [200] preferentially oriented with a low surface resistivity (rho(s) = 0.55 m Omega n cm) and the PLD deposited films were [110] predominated with a slightly larger surface resistivity (rho(s) = 6.38 m Omega cm). Using Pt coating as underneath layer markedly reduced the surface resistivity (rho(s) = 0.05 m Omega cm) without modifying the texture characteristics of the LNO layers. PLZT films subsequently deposited on LNO layers inherited the texture characteristics of the underlying LNO layers. Ferroelectric properties of PLZT films were optimized when using LNO-Pt double layers as bottom electrodes. The remanent polarization and coercive force obtained were P-r = 14.9 mu C/cm(2) and E(c) = 3.5 kV/cm, respectively. (C) 1996 American Institute of Physics.

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页码：2505 / 2507

页数：3

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